Business Wire

DNP Develops Photomask Process for 3nm EUV Lithography

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
TMCnet

Nikon Announces First Back-End Process Lithography System

Accepting Orders Now for the Digital Lithography System DSP-100 Showcasing at SEMICON West 2025 ...
Reuters

Applied Materials unveils new chip tool to lower cost in lithography process

OAKLAND, Calif., Feb 28 (Reuters) - Silicon Valley-based Applied Materials Inc (AMAT.O), opens new tab, among the most important makers of tools for chip manufacturing, said on Tuesday it has started ...
Nasdaq

Canon Commences Sales of the FPA-5520iV LF Option for Back-End Process Semiconductor Lithography Systems

MELVILLE, N.Y., April 8, 2021 /PRNewswire/ -- Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for ...
Business Wire

DNP Accelerates Development of Photomask Manufacturing Process for 2nm Generation EUV Lithography

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...
Nasdaq

Applied Materials’ New eBeam Metrology System Paves the Way to High-NA EUV Lithography

SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...